Fabrication of High Aspect Ratio Nanoscale Pattern Array by Oxygen Plasma Assisted Resist Trimming, Bongho Kim, Daehong Kim, Jihun Kwon, Sungwoo Chun, Seonjun Choi and Seung-Beck Lee, Nano Korea Symposium 2011, August 24, 2011, KINTEX, Korea

 

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