Ashing.jpg


Fabrication of high aspect ratio nanoscale magnetic tunnel junction etch mask by oxygen plasma assisted resist trimming

Bongho Kim, Daehong Kim, Sungwoo Chun, Hyungyu Lee, Seonjun Choi, and Seung-beck Lee, 

ICM 2012, July 13, 2012, Bexco, Busan, Korea