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Negative electron-beam resist hard mask ion beam etching process for the fabrication of nanoscale spin transfer torque magnetic random access memory device

Hyungyu Lee, Daehong Kim, Bongho Kim, Sungwoo Chun, Seonjun Choi, and Seung-beck Lee, 

ICM 2012, July 12, 2012, Bexco, Busan, Korea