Negative electron-beam resist hard mask ion-beam etching process for the fabrication of nanoscale magnetic tunnel junction, Sung-woo Chun, Daehong Kim, Jihun Kwon, Bongho Kim, Hyungyu Lee, Seonjun Choi and Seung-Beck Lee, EIPBN 2012, June 29, 2012, Hilton Waikoloa Village, Hawaii